Cleanup

About us

The Technical Group of Cleanup was formed in 1990. Up to now we have been engaging in cleanup technology of semiconductors, liquid crystals and pharmaceutical products. Hereafter, we plan to expand the coverage of cleanup technology to industrial fields such as machinery and food, and home application of consumer and human body.

Current level of technology, trend and activities in future

  1. Systematization of clean technology to achieve safety security, and comfort
  2. Systematization of measurement technology as a function of particle concentration and particle size
  3. Systematization of gaseous removal technologies and measurement methods as a function of gaseous concentration and gas type
  4. Systematization of PM2.5 removal technology
  5. Systematization of deodorizing technology
  6.  On-line measurement of particulate and gaseous substances
  7.  Microbial contamination prevention technology (cGMP, PIC/S, HACCP, IN-SITU measurement of microbial contamination)
  8. Clean technologies involved in quality control and safety with the keywords of “safety and security” such as GMP, validation, HACCP in the pharmaceutical and food fields
  9. Continued work on the creating and revising international standards for clean rooms and related environments and air filters in ISO/TC142 and 209
  10.  Technology for removing oil mist from cutting equipment

Conductor

Coordinator Kogakuin University NAMIKI Norikazu
Vice Coordinator Associate Professor,Tokyo Institute of Technology KAGI/Naoki
Representative Organizer TOYOBO CO., LTD. HAYASHI/Toshiaki
Vice Representative Organizer RION CO., LTD. MATSUDA/Tomonobu
Organizer CHIYODA CORPORATION. UJI/Katsuyuki
HITACHI, LTD. KAMITANI/Matsuo
HOSOKAWA MICRON CORPORATION ASAMI/Akiyoshi
SHINWA CORPORATION. KATOU/Takayuki
TOKYO DYLEC CORP. UCHIYAMA/Yuya
TOYOTA BOSHOKU CORPORATION KIM/Jincheol