Cleanup

About us

The Technical Group of Cleanup was formed in 1990. Up to now we have been engaging in cleanup technology of semiconductors, liquid crystals and pharmaceutical products. Hereafter, we plan to expand the coverage of cleanup technology to industrial fields such as machinery and food, and home application of consumer and human body.

Current level of technology, trend and activities in future

1)Clean technologies for safe, secure and comfortable lives
2)Requirement for HVAC filters in relation to PM2.5
3)Air pollution control technologies for removal of gaseous and particulate matters
4)Optimization of cleanliness
5)Minienvironment and purification of local environments
6)Validation (cGMP, HACCP, etc.)
7)Adoption of ISO standards developed by ISO/TC209 and TC142 for clean rooms and air filters
8)Clean technology with low energy consumption
9)Clean technology covering nanoparticles to coarse particles
10)Measurement of nanoparticles and gaseous species at extremely low concentration
11)In situ measurement of bioaerosols
12)Administration of ISO standards and their revision

Conductor

Coordinator Kanazawa University,
Graduate School of Natural Science and Technology,
Department of Chemical Engineering
OTANI/Yoshio
Vice Coordinator Associate Professor,Tokyo Institute of Technology KAGI/Naoki
Representative Organizer TOYOBO CO., LTD. HAYASHI/Toshiaki
Vice Representative Organizer RION CO., LTD. MATSUDA/Tomonobu
Organizer HITACHI, LTD. KAMITANI/Matsuo
HOSOKAWA MICRON CORPORATION ASAMI/Akiyoshi
JAPAN AIR FILTER CO., LTD.  KATOU/Takayuki
TOKYO DYLEC CORP. UCHIYAMA/Yuya
TOYOTA BOSHOKU CORPORATION KIM/Jincheol
Emeritus Organizer Hitachi Plant Services Co., Ltd. WATANABE/Koji